@inproceedings{chien:hal-02177870,
  TITLE = {{Constructing a Metrology Sampling Framework for In-line Inspection in Semiconductor Fabrication}},
  AUTHOR = {Chien, Chen-Fu and Lin, Yun-Siang and Tan, Yu-Shin},
  URL = {https://inria.hal.science/hal-02177870},
  NOTE = {Part 2: Service Engineering Based on Smart Manufacturing Capabilities},
  BOOKTITLE = {{IFIP International Conference on Advances in Production Management Systems (APMS)}},
  ADDRESS = {Seoul, South Korea},
  EDITOR = {Ilkyeong Moon and Gyu M. Lee and Jinwoo Park and Dimitris Kiritsis and Gregor von Cieminski},
  PUBLISHER = {{Springer International Publishing}},
  SERIES = {Advances in Production Management Systems. Smart Manufacturing for Industry 4.0},
  VOLUME = {AICT-536},
  NUMBER = {Part II},
  PAGES = {73-80},
  YEAR = {2018},
  MONTH = Aug,
  DOI = {10.1007/978-3-319-99707-0\_10},
  KEYWORDS = {Bayesian decision analysis ; Sampling frequency ; WIP metrology ; Inspection ; Quality control ; Equipment efficiency},
  PDF = {https://inria.hal.science/hal-02177870/file/472851_1_En_10_Chapter.pdf},
  HAL_ID = {hal-02177870},
  HAL_VERSION = {v1},
}